Scrubbing HCl gas using NaOH at 60^oC ; Sodium Hypochlorite ; NaOH + HCl + Methylene Chloride

 Scrubbing SO₂ : 10-25% H₂SO₄ + 7-10% silica solids at 80^oC (Gas Washing in Metal Refineries; Copper, Zinc)

 Scrubbing Fluorine : 15-18% H₂SiF₆ + 5%-10% silica solids at 60-70^oC (Fertilizer Plants)

 Dyes (HCl & H₂SO₄ bases ) at 80-95^oC for filter press feeding (CPC Green Slurry) ; Dye Intermediates (slurry with Bromine , HBr)

 Chlorosulphonated reaction mass with water at 0^oC ; R.T.Blue, Turquoise Blue for filter press feeding

 10% pigment slurry, pH 0.5 - 1 at 80^oC for filter press feeding.

 Conc.HCl, HF recovery / transfer / unloading ; 10% Aqueous, Ammonia, pH>9

 65-75% H₂SO₄ at 80-85^oC ; 98% H₂SO₄ at 30-45^oC

 33% Sodium Dichromate + 20-30% H₂SO₄ at 60-80^oC

 Raw / Mixed Chemical effluents from sump, (acidic/alkaline)

12% HCl + AlCl₃ + Aluminium Hydroxide

 Slurry of BaCO₃ + NaCl + BaSO₄ with 17-26% solids at 85^oC

 13% H₂SO₄ + 23% CaCI₂ + 9% HCl at 50-65^oC

 Dichlorobenzedene Sulphate slurry at 70-80^oC ; 20% Al₂O₃ Slurry (Metal Polishing)

 25% Chromic Acid ; Mixture of 48% H₂SO₄ + 40% HF at 80^oC

 Mixture of HCl + H₂SO₄ + CH₃COOH at 85^oC

 Mixed Acid containing 45% H₂SO₄ + 15% HNO₃ + 3% Oxalic Acid

 Dilute HF + Glass powder Slurry in Glass Etching Process (TV Tube Mfg.); FeCI₃ in Etching Process

 Chlorine Back Water (pH 1-2) ; 10% Na₂CO₃ Soln, Alum, Chlorinated Brine.

 Hg₂Cl₂ 30gpl + 3gpl Cl₂ + 1% SO₂ (Mercury Removal Plant)

 Sodium Sulphite + Sodium Disulphite, 30% HCl + Chlorinated Toluene

 65% Ferric Oxide Slurry; 65% Silicon Dioxide Slurry in Filter Press Feeding(Semi Conductor Industry)

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